Lithographic apparatus for step-and-scan imaging of mask pattern with interferometer mirrors on the mask and wafer holders
US6084673A · kind A · utility
27Cited by
12References
15Claims
0Family size
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Key dates
| Filing date | Mar 4, 1997 |
| Grant date | Jul 4, 2000 |
| Priority date | — |
| Expiry date | Mar 4, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus for step-and-scan imaging of a mask pattern (c) on a substrate (W) is described. The synchronous movement of the mast (MA) and the substrate (W) during scanning is controlled by means of contactless measuring systems, inter alia, interferometer systems (ISR, ISW), while the measuring faces (R.sub.1,r, R.sub.1,w) associated with these systems are formed by faces of the holders (WH, MH) for the substrate (W) and the mask (MA), so that very accurate measurements are possible.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.