Optical interference alignment and gapping apparatus
US6088103A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 9, 1998 |
| Grant date | Jul 11, 2000 |
| Priority date | — |
| Expiry date | Sep 9, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2290/30
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Alignment marks on first and second plates include a plurality of periodic gratings. A grating on a first plate has a period or pitch p.sub.1 paired up with a grating on the second plate that has a slightly different period p.sub.2. A grating on the first plate having a period p.sub.3 is paired up with a grating on the second plate having a slightly different period p.sub.4. Illuminating the gratings produces a first interference pattern characterized by a first interference phase where beams diffracted from the first and second gratings overlap and a second interference pattern characterized by a second interference phase where beams diffracted from the third and fourth gratings overlap. The plates are moved until the difference between the first and second interference phases correspond to a predetermined interference phase difference. Further invention uses an interrupted-grating pattern on the second plate with certain advantages. Further advantages are obtained using a checkerboard pattern on the second plate. In addition two inventions are made for measuring gap. One method uses the same marks on the second plate as used in aligning, and the second uses no marks on the second…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.