Multi-zone gas flow control in a process chamber
US6090210A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 24, 1996 |
| Grant date | Jul 18, 2000 |
| Priority date | — |
| Expiry date | Jul 24, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A showerhead for introducing gas from one or more external supplies into a substrate processing chamber, the showerhead including a faceplate including a plurality of gas injection ports through which gas is injected into the chamber, wherein the plurality of gas injection ports includes a first subset of gas injection ports and a second subset of gas injection ports; a first gas distribution system which during use delivers a first gas to the first subset of injection ports for injection into the chamber; and a second gas distribution system which during use delivers a second gas to the second subset of injection ports for injection into the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.