Photo-assisted remote plasma apparatus and method
US6095085A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Aug 20, 1998 |
| Grant date | Aug 1, 2000 |
| Priority date | — |
| Expiry date | Aug 20, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/452
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention provides a plasma processing system comprising a remote plasma activation region for formation of active gas species, a transparent transfer tube coupled between the remote activation region and a semiconductor processing chamber, and a source of photo energy for maintaining activation of the active species during transfer from the remote plasma activation region to the processing chamber. The source of photo energy preferably includes an array of UV lamps. Additional UV lamps may also be used to further sustain active species and assist plasma processes by providing additional in-situ energy through a transparent window of the processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.