Antireflective coating material for photoresists
US6106995A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 12, 1999 |
| Grant date | Aug 22, 2000 |
| Priority date | — |
| Expiry date | Aug 12, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to an antireflective coating composition comprising an admixture of: PA0 a) a polymer defined by the following structure: ##STR1## where, R.sub.1 & R.sub.2 are independently hydrogen, or C.sub.1 to C.sub.5 alkyl PA1 R.sub.3 is a methyl, ethyl, propyl or butyl group PA1 R.sub.4 -R.sub.7 are independently hydrogen, or C.sub.1 to C.sub.5 alkyl PA1 n=10 to 50,000 PA0 (b) a fluorine-containing, sparingly water-soluble (0.1%-10% by weight in water) organic C.sub.3 -C.sub.13 aliphatic carboxylic acid; PA0 (c) a non-metallic hydroxide; and PA0 (d) a solvent. The invention also relates to a method for producing such an antireflective coating composition and to a method for producing a microelectronic device using such an antireflective coating composition in conjunction with a photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.