Nano-porous copolymer films having low dielectric constants
US6107184A · kind A · utility
33Cited by
19References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 9, 1998 |
| Grant date | Aug 22, 2000 |
| Priority date | — |
| Expiry date | Dec 9, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/958
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for forming thin copolymer layers having low dielectric constants on semiconductor substrates includes in situ formation of p-xylylenes, or derivatives thereof, from solid or liquid precursors such as cyclic p-xylylene dimer, p-xylene, 1,4-bis(formatomethyl)benzene, or 1,4-bis(N-methyl-aminomethyl)benzene. P-xylylene is copolymerized with a comonomer having labile groups that are converted to dispersed gas bubbles after the copolymer layer is deposited on the substrate. Preferred comonomers comprise diazocyclopentadienyl, diazoquinoyl, formyloxy, or glyoxyloyloxy groups.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.