Boride electrodes and barriers for cell dielectrics
US6111285A · kind A · utility
15Cited by
17References
47Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 17, 1998 |
| Grant date | Aug 29, 2000 |
| Priority date | — |
| Expiry date | Mar 17, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B12/485
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Titanium boride (TiB.sub.x), zirconium boride (ZrB.sub.x) and hafnium boride (HfB.sub.x) barriers and electrodes for cell dielectrics for integrated circuits, particularly for DRAM cell capacitors. The barriers protect cell dielectrics from diffusion and other interaction with surrounding materials during subsequent thermal processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.