Scanning electron microscope and method for dimension measuring by using the same
US6114695A · kind A · utility
35Cited by
14References
4Claims
0Family size
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Key dates
| Filing date | May 10, 1999 |
| Grant date | Sep 5, 2000 |
| Priority date | — |
| Expiry date | May 10, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/281
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An electron beam which can transmit through part of a specimen and can reach a portion not exposing to the electron beam is irradiated and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A cubic model is assumed, the cubic model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified cubic model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.