Adjustable low profile gimbal system for chemical mechanical polishing
US6116990A · kind A · utility
18Cited by
24References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 9, 1999 |
| Grant date | Sep 12, 2000 |
| Priority date | — |
| Expiry date | Feb 9, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/30
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A low profile gimbal system is provided to greatly reduce the generation of moments about a pivot point of the gimbal system during polishing processes. The gimbal system is adjustable so that a preferred balance between stiffness and friction may be selected as appropriate for a variety of different polishing conditions. A locking feature ensures that the adjustment setting is maintained during polishing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.