Ceramic composition for an apparatus and method for processing a substrate
US6123791A · kind A · utility
66Cited by
4References
52Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 29, 1998 |
| Grant date | Sep 26, 2000 |
| Priority date | — |
| Expiry date | Jul 29, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S156/914
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A ceramic composition of matter for a process kit and a dielectric window of a reactor chamber wherein substrates are processed in a plasma of a processing gas. The ceramic composition of matter contains a ceramic compound (e.g. Al.sub.2 O.sub.3) and an oxide of a Group IIIB metal (e.g., Y.sub.2 O.sub.3). A method for processing (e.g. etching) a substrate in a chamber containing a plasma of a processing gas. The method includes passing processing power through a dielectric window which is formed from the ceramic composition of matter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.