Increasing the sensitivity of an in-situ particle monitor
US6125789A · kind A · utility
537Cited by
13References
31Claims
0Family size
Assignee
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Key dates
| Filing date | Jan 30, 1998 |
| Grant date | Oct 3, 2000 |
| Priority date | — |
| Expiry date | Jan 30, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N15/0205
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for increasing the sensitivity of an in situ particle monitor. A light scattering technique, preferably using laser light, is employed to monitor particle concentrations within the processing chamber of a plasma-based substrate processing system. Particle concentrations are increased in the light field of the sensor by creating an electric or magnetic field in the processing chamber to concentrate the particles suspended therein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.