Photoresist develop and strip solvent compositions and method for their use
US6127097A · kind A · utility
15Cited by
8References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 18, 1997 |
| Grant date | Oct 3, 2000 |
| Priority date | — |
| Expiry date | Mar 18, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/325
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Simple, environmentally friendly developers and strippers are disclosed for free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and photoresists. Both the developers and the strippers include benzyl alcohol, optionally also including a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.