Ion beam milling to generate custom reticles
US6130012A · kind A · utility
56Cited by
5References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 13, 1999 |
| Grant date | Oct 10, 2000 |
| Priority date | — |
| Expiry date | Jan 13, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/74
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Various methods of fabricating a reticle are provided. In one aspect, a pattern of opaque structures is formed on a plate capable of transmitting electromagnetic radiation. Adjacently positioned angled surfaces of the opaque structures are identified. Preselected portions of the opaque structures that encompass the adjacently positioned angled surfaces are then removed by ion-beam milling or other methods. Reticle patterns may be customized by modifying the structures of adjacent polygon structures that could otherwise give rise to diffraction-induced patterning errors on resist layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.