Co-rotating edge ring extension for use in a semiconductor processing chamber
US6133152A · kind A · utility
24Cited by
3References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 16, 1997 |
| Grant date | Oct 17, 2000 |
| Priority date | — |
| Expiry date | May 16, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68792
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus to isolate a rotating frame in a processing chamber, comprising: a support cylinder rotatably extending from the rotating frame; and a co-rotating edge ring extension extending from the support cylinder to at least one of substantially thermally, optically and mechanically isolate the region above the co-rotating edge ring extension from the region below the co-rotating edge ring extension.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.