Processing system
US6133981A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 5, 1998 |
| Grant date | Oct 17, 2000 |
| Priority date | — |
| Expiry date | Jun 5, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67748
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A processing system includes a coating/developing station for performing either a solution processing for processing a substrate using solution or a thermal processing for thermally processing the substrate, and a transfer unit for transferring the substrate into and from the coating/developing station. A casing encases the coating/developing station and the transfer unit. An interface section, provided in the casing, transfers the substrate into and from an external exposure machine for exposing the resist on the substrate. A pressure setting device sets a pressure in the casing to be lower than a pressure in the external exposure machine.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.