Exposure apparatus having dynamically isolated support structure
US6151105A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 27, 1999 |
| Grant date | Nov 21, 2000 |
| Priority date | — |
| Expiry date | May 27, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T74/20201
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes an exposure device disposed between a mask and an object. The exposure device exposes a pattern of the mask onto the object. The apparatus also includes a mask stage associated with the exposure device to hold the mask, and a drive to move the mask stage. At least part of the drive is connected to a first support structure so that a reaction force exerted by movement of the mask stage by the drive is transferred to the first support structure. A second support structure is provided, which is dynamically isolated from the first support structure. A position detector is supported by the second support structure, and detects a position of the mask stage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.