Alignment device and lithographic apparatus comprising such a device
US6160622A · kind A · utility
70Cited by
10References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 18, 1998 |
| Grant date | Dec 12, 2000 |
| Priority date | — |
| Expiry date | Jun 18, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7069
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An alignment device, for use in a lithographic apparatus, for aligning a first object, provided with a first alignment mark relative to a second object, provided with a second alignment mark, employs as a radiation source a laser which emits an alignment beam having a wavelength which is of the order of 1000 nm and to the order of 1100 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.