Monitoring apparatus and method particularly useful in photolithographically processing substrates
US6166801A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 2, 1998 |
| Grant date | Dec 26, 2000 |
| Priority date | — |
| Expiry date | Nov 2, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/135
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.