Yoel Cohen
35Patents
7h-index
11Co-inventors
66Inventor score
Filing activity: Nov 2, 1998 → Sep 13, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6166801A | Monitoring apparatus and method particularly useful in photolithographically processing substrates | Emerging Cross-Sectional Technologies | 94 | Expired |
| US6704920B2 | Process control for micro-lithography | Electricity | 61 | Expired |
| US6424417B1 | Method and system for controlling the photolithography process | Physics | 36 | Expired |
| US6643017B2 | Method and system for controlling the photolithography process | Physics | 14 | Expired |
| US6842220B1 | Monitoring apparatus and method particularly useful in photolithographically processing substrates | Physics | 11 | Expired |
| US8289515B2 | Method and system for use in monitoring properties of patterned structures | Physics | 10 | Active |
| US7030957B2 | Monitoring apparatus and method particularly useful in photolithographically processing substrates | Physics | 8 | Expired |
| US7327476B2 | Thin films measurement method and system | Electricity | 7 | Expired |
| US7289190B2 | Monitoring apparatus and method particularly useful in photolithographically | Physics | 5 | Expired |
| US6720568B2 | Method and system for optical inspection of a structure formed with a surface relief | Physics | 4 | Expired |
| US10024650B2 | System for analyzing optical properties of an object | Physics | 3 | Active |
| US7595896B2 | Thin films measurement method and system | Electricity | 3 | Active |
| US7525634B2 | Monitoring apparatus and method particularly useful in photolithographically | Physics | 3 | Active |
| US9757027B2 | System and method for performing tear film structure measurement and evaporation rate measurements | Physics | 3 | Active |
| US9833139B1 | System and method for performing tear film structure measurement | Physics | 2 | Active |
| US8482715B2 | Monitoring apparatus and method particularly useful in photolithographically processing substrates | Physics | 2 | Active |
| US10456029B2 | Apparatus and method for detecting surface topography | Physics | 2 | Active |
| US9291911B2 | Monitoring apparatus and method particularly useful in photolithographically processing substrates | Physics | 2 | Active |
| US8040532B2 | Thin films measurement method and system | Electricity | 1 | Active |
| US10024783B2 | Interferometric ellipsometry and method using conical refraction | Physics | 1 | Active |
| US10054419B2 | Method for analyzing an object using a combination of long and short coherence interferometry | Physics | 1 | Active |
| US8964178B2 | Method and system for use in monitoring properties of patterned structures | Physics | 1 | Active |
| US12213733B2 | System and method for detecting physical characteristics of a multilayered tissue of a subject | Human Necessities | 0 | Active |
| US8780320B2 | Monitoring apparatus and method particularly useful in photolithographically processing substrates | Physics | 0 | Active |
| US11965777B2 | Apparatus and methods for calibrating optical measurements | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.