Stage apparatus with improved positioning capability
US6172373A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 18, 1999 |
| Grant date | Jan 9, 2001 |
| Priority date | — |
| Expiry date | Oct 18, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7034
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus comprises a projection optical system, which projects a pattern formed on a mask on a photosensitive substrate, a mounting object table, which holds the photosensitive substrate, a positioning stage, which positions the mounting object table along a 2-dimensional movement coordinate system, a stage coordinate measurement device, which detects the position of the mounting object table in the 2-dimensional movement coordinate system, a height measurement device, which detects the deviation in the optical axis direction of the projection optical system from the surface of the photosensitive substrate to a specified standard surface in a measurement point fixed with regard to the 2-dimensional movement coordinate system, a levelling device, which adjusts the inclination of the mounting object table with regard to the positioning stage, a computation device, which calculates the amount of levelling necessary to match the surface of the photosensitive substrate with the standard surface, a control device, which controls the levelling device based on the calculation results of the computation device, and a memory device, which stores the optical axis direction displa…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.