Exposure apparatus having dynamically isolated reaction frame
US6175404A · kind A · utility
102Cited by
74References
27Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 27, 1999 |
| Grant date | Jan 16, 2001 |
| Priority date | — |
| Expiry date | May 27, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T74/20201
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes an exposure device disposed between a mask and an object. The exposure device exposes a pattern of the mask onto the object. The apparatus also includes a movable mask stage to hold the mask and a movable object stage to hold the object. The apparatus also includes a reaction frame that is dynamically isolated from the exposure device. A reaction force caused by movement of the mask stage and the object stage when the mask stage and the object stage are moved by a drive is transferred substantially to the reaction frame.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.