Method and apparatus for general systematic application of proximity correction
US6175953A · kind A · utility
16Cited by
21References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 3, 1998 |
| Grant date | Jan 16, 2001 |
| Priority date | — |
| Expiry date | Mar 3, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is a method and apparatus for systematically applying proximity corrections to a mask pattern, wherein the pattern is divided into a grid of equally sized grid rectangles, an inner rectangle comprising a plurality of grid rectangles is formed, an outer rectangle comprising a second plurality of grid rectangles and the inner rectangle is formed and proximity correction is applied to the pattern contained within the inner rectangle as a function of the pattern contained within the outer rectangle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.