Multideck wafer processing system
US6176667A · kind A · utility
243Cited by
38References
44Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 30, 1996 |
| Grant date | Jan 23, 2001 |
| Priority date | — |
| Expiry date | Apr 30, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/141
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A multideck wafer processing system is described for the treatment of semiconductor wafers. The system includes at least two process chambers stacked one above the other to provide for higher wafer throughput per unit area of cleanroom space. The stacked process chambers enable sharing of pressurization, gas, electrical, and control support services for the processing chambers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.