Apparatus and method for controlling a flow of process material to a deposition chamber
US6176930A · kind A · utility
24Cited by
6References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 4, 1999 |
| Grant date | Jan 23, 2001 |
| Priority date | — |
| Expiry date | Mar 4, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus and method for controlling a flow of process material to a deposition chamber. The apparatus comprises an injector valve, disposed between the process material source and the deposition chamber. The injector valve controls the flow of precursor material by repeatedly opening and closing the injector valve with a predetermined duty cycle. The apparatus further comprises an evaporator coupled to the injector valve for evaporating the precursor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.