Carrier head with a flexible membrane for a chemical mechanical polishing system
US6183354A · kind A · utility
157Cited by
19References
92Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 21, 1997 |
| Grant date | Feb 6, 2001 |
| Priority date | — |
| Expiry date | May 21, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/32
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A carrier head for a chemical mechanical polishing apparatus. The carrier head includes a housing, a base, a loading mechanism, a gimbal mechanism, and a substrate backing assembly. The substrate backing assembly includes a support structure positioned below the base, a substantially horizontal, annular flexure connecting the support structure to the base, and a flexible membrane connected to the support structure. The flexible membrane has a mounting surface for a substrate, and extends beneath the base to define a chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.