Method to accurately determine classification codes for defects during semiconductor manufacturing
US6185511A · kind A · utility
20Cited by
5References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 28, 1997 |
| Grant date | Feb 6, 2001 |
| Priority date | — |
| Expiry date | Nov 28, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of determining classification codes for defects occurring in semiconductor processes comparing images of defects from a first selected wafer with images of defects in a first image reference library. The images in the first image reference library are updated from a master image reference library. The images in the master image reference library are the best images of defect types. The images in the master image reference library are in a format readable by all review stations utilized to review the images of the defect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.