Manufacturing method for micromechanical component
US6187607A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 15, 1999 |
| Grant date | Feb 13, 2001 |
| Priority date | — |
| Expiry date | Apr 15, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/053
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A manufacturing method for a micromechanical component, and in particular for a micromechanical rotation rate sensor, which has a supporting first layer, an insulating second layer that is arranged on the first layer, and a conductive third layer that is arranged on the second layer. The method includes the following steps: provide the second layer, in the form of patterned first and second insulation regions, on the first layer; provide a first protective layer on an edge region of the first insulation regions and on a corresponding boundary region of the first layer; provide the third layer on the structure resulting from the previous steps; pattern out a structure of conductor paths running on the first insulation regions, and a functional structure of the micromechanical component above the second insulation regions, from the third layer; and remove the second layer in the second insulation regions, the second layer being protected in the first insulation regions by the first protective layer in such a way that it is essentially not removed there.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.