Method and apparatus for cleaning a vacuum line in a CVD system
US6194628A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 25, 1995 |
| Grant date | Feb 27, 2001 |
| Priority date | — |
| Expiry date | Sep 25, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for preventing particulate matter and residue build-up within a vacuum exhaust line of a semiconductor processing device. The apparatus uses RF energy to form excite the constituents of particulate matter exhausted from a semiconductor processing chamber into a plasma state such that the constituents react to form gaseous products that may be pumped through the vacuum line. The apparatus may include a collection chamber structured and arranged to collect particulate matter flowing through the apparatus and inhibiting egress of the particulate matter from the apparatus. The apparatus may further include an electrostatic collector to enhance particle collection in the collection chamber and to further inhibit egress of the particulate matter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.