Sebastien Raoux
23Patents
18h-index
40Co-inventors
77Inventor score
Filing activity: Nov 19, 1992 → Mar 14, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6863019B2 | Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas | Emerging Cross-Sectional Technologies | 549 | Expired |
| US7736600B2 | Apparatus for manufacturing a process abatement reactor | Mechanical Engineering; Lighting; Heating | 364 | Active |
| US6162709A | Use of an asymmetric waveform to control ion bombardment during substrate processing | Electricity | 126 | Expired |
| US6193802A | Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment | Emerging Cross-Sectional Technologies | 90 | Expired |
| US6358573B1 | Mixed frequency CVD process | Electricity | 87 | Expired |
| US6194628A | Method and apparatus for cleaning a vacuum line in a CVD system | Emerging Cross-Sectional Technologies | 83 | Expired |
| US7004107B1 | Method and apparatus for monitoring and adjusting chamber impedance | Electricity | 82 | Expired |
| US6187072A | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions | Emerging Cross-Sectional Technologies | 71 | Expired |
| US6045618A | Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment | Emerging Cross-Sectional Technologies | 70 | Expired |
| US6041734A | Use of an asymmetric waveform to control ion bombardment during substrate processing | Electricity | 66 | Expired |
| US6098568A | Mixed frequency CVD apparatus | Electricity | 52 | Expired |
| US6432256B1 | Implanatation process for improving ceramic resistance to corrosion | Electricity | 46 | Expired |
| US6366346B1 | Method and apparatus for optical detection of effluent composition | Electricity | 39 | Expired |
| US6136388A | Substrate processing chamber with tunable impedance | Electricity | 33 | Expired |
| US6517913B1 | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions | Emerging Cross-Sectional Technologies | 30 | Expired |
| US6680420B2 | Apparatus for cleaning an exhaust line in a semiconductor processing system | Emerging Cross-Sectional Technologies | 30 | Expired |
| US7160521B2 | Treatment of effluent from a substrate processing chamber | Performing Operations; Transporting | 29 | Expired |
| US6354241B1 | Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing | Performing Operations; Transporting | 19 | Expired |
| US7700049B2 | Methods and apparatus for sensing characteristics of the contents of a process abatement reactor | Mechanical Engineering; Lighting; Heating | 14 | Active |
| US6888639B2 | In-situ film thickness measurement using spectral interference at grazing incidence | Electricity | 8 | Expired |
| US5319653A | Integrated optical component structure | Electricity | 8 | Expired |
| US7970483B2 | Methods and apparatus for improving operation of an electronic device manufacturing system | Mechanical Engineering; Lighting; Heating | 5 | Active |
| US7532952B2 | Methods and apparatus for pressure control in electronic device manufacturing systems | Mechanical Engineering; Lighting; Heating | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.