Photoresist cross-linking monomers, photoresist polymers and photoresist compositions comprising the same
US6200731A · kind A · utility
5Cited by
4References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 16, 1999 |
| Grant date | Mar 13, 2001 |
| Priority date | — |
| Expiry date | Dec 16, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention discloses a cross-linking monomer for a photoresist polymer represented by following Chemical Formula 1: <Chemical Formula 1> ##STR1## PA1 wherein, V represents CH.sub.2, CH.sub.2 CH.sub.2, oxygen or sulfur; Y is selected from the group consisting of straight or branched C.sub.1-10 alkyl, oxygen, and straight or branched C.sub.1-10 ether; R' and R" individually represent H or CH.sub.3 ; i is a number of 1 to 5; and n is a number of 0 to 3; and a process for preparing a photoresist copolymer comprising the same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.