Photoresist comprising blends of photoacid generators
US6203965A · kind A · utility
10Cited by
7References
4Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Apr 19, 2000 |
| Grant date | Mar 20, 2001 |
| Priority date | — |
| Expiry date | Apr 19, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size. A specific composition comprises a terpolymer having units of hydroxystyrene, styrene and t-butyl acrylate with the photoacid generators di-(4-tbutylphenyl)iodonium camphorsulfonate and di-(4-t-butylphenyl)iodonium o-trifluoromethylbenzene sulfonate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.