Method to eliminate side lobe printing of attenuated phase shift masks
US6214497A · kind A · utility
19Cited by
12References
37Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 29, 1999 |
| Grant date | Apr 10, 2001 |
| Priority date | — |
| Expiry date | Jun 29, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a method of reducing side lobe printing using an attenuated phase shift mask that is designed to diminish the background of the attenuating portions that would otherwise be associated with a side lobe. The present invention reduces the magnitude of the side lobe by placing an opaque material on the partially light transmissive material so as to reduce or prevent the background of the attenuating portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.