Polymers and positive resist compositions
US6221989A · kind A · utility
4Cited by
1References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 13, 1999 |
| Grant date | Apr 24, 2001 |
| Priority date | — |
| Expiry date | May 13, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G8/28
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A novel polymer is provided in the form of a novolac resin in which some of the hydrogen atoms of hydroxyl groups are replaced by 1,2-naphthoquinonediazidosulfonyl ester groups, triazinyl groups and optionally, substituted carbonyl or sulfonyl groups. A positive resist composition comprising the polymer has improved sensitivity, resolution and developability in microfabrication as well as improved heat resistance and low-temperature curability in forming interlayer insulating film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.