Method and system for reducing ARC layer removal by providing a capping layer for the ARC layer
US6222241A · kind A · utility
13Cited by
1References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 29, 1999 |
| Grant date | Apr 24, 2001 |
| Priority date | — |
| Expiry date | Oct 29, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10B41/49
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and system for providing a semiconductor device is disclosed. The method and system include depositing an antireflective coating (ARC) layer having antireflective properties. The method and system also include depositing a capping layer on the ARC layer. The capping layer reduces a susceptibility of the ARC layer to removal while allowing the ARC layer to substantially retain the antireflective properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.