Supporting device provided with a gas spring with a gas bearing, and lithographic device provided with such supporting devices
US6226075A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 6, 1998 |
| Grant date | May 1, 2001 |
| Priority date | — |
| Expiry date | Jul 6, 2018 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70825
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
A supporting device (53) provided with a first part (69), a second part (71), and a gas spring (73) for supporting the second part relative to the first part parallel to a support direction (Z). The gas spring (73) comprises a pressure chamber (75) which is provided in an intermediate part (79) and is bounded by a piston (81) which is displaceable in the intermediate part (79) parallel to the support direction and is supported perpendicularly to the support direction by means of a static gas bearing (85). A stiffness of the supporting device parallel to the support direction is thus substantially entirely determined by a stiffness of the gas spring, and a low stiffness can be achieved through a suitable design of the gas spring. A transmission of vibrations directed parallel to the support direction from the first part to the second part is prevented as much as possible thereby. The invention also relates to a lithography device having a plurality of such supporting devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.