Low-pressure processing system for magnetic orientation of thin magnetic film
US6235164A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 18, 1999 |
| Grant date | May 22, 2001 |
| Priority date | — |
| Expiry date | Mar 18, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3402
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A sputtering apparatus for depositing a thin film (66) of magnetic material on a substrate (26) is modified to include a plate-shaped electromagnet (34, 44, or 70) for orienting magnetic domains within the film (66). The electromagnet (34, 44, or 70) has conductive windings (38; 46, 48, and 50; or 72) that are arranged for producing a magnetic field (42 or 52) within a plane (60) corresponding to a surface of the substrate (26). Field strength vectors (68) vary in absolute magnitude between points located along a first axis (62), but have substantially uniform components of magnitude at the same points measured in a common direction along the first axis (62).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.