Low dielectric constant films with high glass transition temperatures made by electron beam curing
US6235353A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 5, 1999 |
| Grant date | May 22, 2001 |
| Priority date | — |
| Expiry date | Feb 5, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S522/905
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Production of a dielectric coating on a substrate whereby a poly(arylene ethers) or fluorinated poly(arylene ethers) layer is cured by exposure to electron beam radiation. A wide area electron beam is used which causes chemical reactions to occur in the polymer structure which are thought to cause crosslinks between polymer chains. The crosslinks lead to higher mechanical strength and higher glass transition temperature, lower thermal expansion coefficient, greater thermal-chemical stability and greater resistance to aggressive organic solvents. The polymer layer may also be optionally heated, thermally annealed, and/or exposed to UV actinic light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.