Photoresist monomers, polymers thereof, and photoresist compositions containing the same
US6235447A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 15, 1999 |
| Grant date | May 22, 2001 |
| Priority date | — |
| Expiry date | Oct 15, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to novel monomers which can be used to form photoresist polymers and photoresist compositions using the same which are suitable for photolithography processes employing a far ultraviolet light source, copolymers thereof. Preferred monomers of the invention are represented by Chemical Formula 1 below: ##STR1## PA1 wherein, X.sub.1 and X.sub.2 individually represent CH.sub.2, CH.sub.2 CH.sub.2, oxygen or sulfur; Y represents CH.sub.2 or oxygen; R.sub.1 represents H or CH.sub.3, R' and R" individually represent substituted or non-substituted (C.sub.0 -C.sub.3) alkyl; and i represents an integer from 0 to 3.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.