Method of forming sharp corners in a photoresist layer
US6238850A · kind A · utility
38Cited by
13References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 23, 1999 |
| Grant date | May 29, 2001 |
| Priority date | — |
| Expiry date | Aug 23, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of forming an image having reduced comer rounding in a photoresist layer is provided which comprises exposing a photoresist layer to a first mask having a first image, said first image having at least two edges; exposing said photoresist layer to a second mask having a second image, said second image having at least two edges, the second image edges being substantially rotated relative to the first image edges to produce a latent image in said photoresist layer having edges substantially rotated relative to the first and second image edges; and developing the photoresist layer to produce said image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.