Orest Bula
22Patents
11h-index
21Co-inventors
71Inventor score
Filing activity: May 6, 1991 → Jun 27, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6425112B1 | Auto correction of error checked simulated printed images | Physics | 220 | Expired |
| US6016357A | Feedback method to repair phase shift masks | Physics | 114 | Expired |
| US6373975B1 | Error checking of simulated printed images with process window effects included | Physics | 54 | Expired |
| US6238850A | Method of forming sharp corners in a photoresist layer | Physics | 38 | Expired |
| US5317573A | Apparatus and method for real time data error capture and compression redundancy analysis | Physics | 29 | Expired |
| US6395438B1 | Method of etch bias proximity correction | Physics | 24 | Expired |
| US6214494A | Serif mask design methodology based on enhancing high spatial frequency contribution for improved printability | Physics | 20 | Expired |
| US6383719B1 | Process for enhanced lithographic imaging | Physics | 16 | Expired |
| US6627361B2 | Assist features for contact hole mask patterns | Physics | 13 | Expired |
| US6539321B2 | Method for edge bias correction of topography-induced linewidth variation | Physics | 11 | Expired |
| US6704695B1 | Interactive optical proximity correction design method | Physics | 11 | Expired |
| US6268908A | Micro adjustable illumination aperture | Physics | 8 | Expired |
| US7257247B2 | Mask defect analysis system | Physics | 7 | Expired |
| US6261724A | Method of modifying a microchip layout data set to generate a predicted mask printed data set | Physics | 7 | Expired |
| US6577406B2 | Structure for lithographic focus control features | Physics | 6 | Expired |
| US6429469B1 | Optical Proximity Correction Structures Having Decoupling Capacitors | Electricity | 4 | Expired |
| US6258490A | Transmission control mask utilized to reduce foreshortening effects | Physics | 3 | Expired |
| US5093584A | Self calibrating timing circuit | Electricity | 2 | Expired |
| US6458493B2 | Method to control nested to isolated line printing | Physics | 2 | Expired |
| US7492940B2 | Mask defect analysis system | Physics | 1 | Active |
| US6667136B2 | Method to control nested to isolated line printing | Physics | 1 | Expired |
| US7492941B2 | Mask defect analysis system | Physics | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.