Polymers, resist compositions and patterning method
US6242151A · kind A · utility
5Cited by
5References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 11, 1999 |
| Grant date | Jun 5, 2001 |
| Priority date | — |
| Expiry date | Aug 11, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/023
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The invention provides a novel polymer in the form of a novolac resin in which some of the hydrogen atoms of the hydroxyl groups are replaced by 1,2-naphthoquinonediazidosulfonyl ester groups and some of the hydrogen atoms of the remaining hydroxyl groups are replaced by substituted carbonyl or sulfonyl groups. The polymer has a weight average molecular weight calculated as polystyrene of 1,000-30,000. The polymer is formulated into a resist composition having improved uniformity, sensitivity, resolution and pattern geometry in microfabrication.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.