Exposure apparatus and method of cleaning optical element of the same
US6252648A · kind A · utility
45Cited by
14References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 1, 1999 |
| Grant date | Jun 26, 2001 |
| Priority date | — |
| Expiry date | Feb 1, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70925
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus in which an exposure process is performed by projecting an exposure beam of X-rays or ultraviolet rays from an excimer laser, for example, to a substrate, is provided with an arrangement wherein an inert gas containing a small amount of oxygen is supplied to a closed space where an optical element is disposed, and wherein the exposure beam is projected thereto by which ozone is produced in the closed space. An organic compound deposited on the optical element can be removed by a photochemical reaction through projection of the exposure beam and the produced ozone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.