Selective etching of silicate
US6254796A · kind A · utility
10Cited by
12References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 29, 1998 |
| Grant date | Jul 3, 2001 |
| Priority date | — |
| Expiry date | Dec 29, 2018 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K13/08
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A silicate glass is selectively etched employing a composition containing a fluoride containing compound and certain organic solvents. Preferred compositions also include water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.