Kenneth McCullough
44Patents
13h-index
31Co-inventors
77Inventor score
Filing activity: Oct 16, 1996 → Oct 2, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5908510A | Residue removal by supercritical fluids | Emerging Cross-Sectional Technologies | 110 | Expired |
| US5976264A | Removal of fluorine or chlorine residue by liquid CO.sub.2 | Emerging Cross-Sectional Technologies | 95 | Expired |
| US6558475B1 | Process for cleaning a workpiece using supercritical carbon dioxide | Emerging Cross-Sectional Technologies | 63 | Expired |
| US6346484B1 | Method for selective extraction of sacrificial place-holding material used in fabrication of air gap-containing interconnect structures | Electricity | 38 | Expired |
| US6561220B2 | Apparatus and method for increasing throughput in fluid processing | Emerging Cross-Sectional Technologies | 37 | Expired |
| US5780363A | Etching composition and use thereof | Emerging Cross-Sectional Technologies | 26 | Expired |
| US6033996A | Process for removing etching residues, etching mask and silicon nitride and/or silicon dioxide | Emerging Cross-Sectional Technologies | 26 | Expired |
| US6425956B1 | Process for removing chemical mechanical polishing residual slurry | Emerging Cross-Sectional Technologies | 25 | Expired |
| US6200891A | Removal of dielectric oxides | Electricity | 24 | Expired |
| US6398875B1 | Process of drying semiconductor wafers using liquid or supercritical carbon dioxide | Emerging Cross-Sectional Technologies | 23 | Expired |
| US6584989B2 | Apparatus and method for wet cleaning | Emerging Cross-Sectional Technologies | 22 | Expired |
| US6622507B2 | Electromechanical device and a process of preparing same | Emerging Cross-Sectional Technologies | 20 | Expired |
| US6451375B1 | Process for depositing a film on a nanometer structure | Performing Operations; Transporting | 14 | Expired |
| US6656666B2 | Topcoat process to prevent image collapse | Electricity | 13 | Expired |
| US6066267A | Etching of silicon nitride | Electricity | 13 | Expired |
| US6150282A | Selective removal of etching residues | Emerging Cross-Sectional Technologies | 13 | Expired |
| US5965465A | Etching of silicon nitride | Electricity | 12 | Expired |
| US6834671B2 | Check valve for micro electro mechanical structure devices | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6254796A | Selective etching of silicate | Chemistry; Metallurgy | 10 | Expired |
| US6875286B2 | Solid CO2 cleaning | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6454869B1 | Process of cleaning semiconductor processing, handling and manufacturing equipment | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6736906B2 | Turbine part mount for supercritical fluid processor | Performing Operations; Transporting | 9 | Expired |
| US7081208B2 | Method to build a microfilter | Performing Operations; Transporting | 9 | Expired |
| US6838015B2 | Liquid or supercritical carbon dioxide composition | Chemistry; Metallurgy | 8 | Expired |
| US6890855B2 | Process of removing residue material from a precision surface | Electricity | 8 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.