Vertical-heat-treatment apparatus with movable lid and compensation heater movable therewith
US6259061A · kind A · utility
25Cited by
7References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 9, 1998 |
| Grant date | Jul 10, 2001 |
| Priority date | — |
| Expiry date | Sep 9, 2018 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67109
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A vertical-heat-treatment apparatus for semiconductor wafers has a compensation heater disposed under a lid for opening and closing a port at the bottom of a process chamber. The compensation heater heats the semiconductor wafers on a wafer boat from below through a window arranged on the lid. The compensation heater has seven heating lamps attached to a fixed base, which is vertically moved along with the lid, and rotatable reflection mirrors respectively surrounding the lamps.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.