Scanning type exposure apparatus
US6259511A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 30, 1999 |
| Grant date | Jul 10, 2001 |
| Priority date | — |
| Expiry date | Nov 30, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70775
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A scanning type exposure apparatus includes a mask stage which can move a mask along a predetermined scanning direction; a substrate stage which can move a substrate, onto which a pattern on the mask is to be transferred, along the scanning direction; a fine movement stage which is arranged on one of the mask stage and the substrate stage, and is movable along the scanning direction relative to the one stage; a first measuring device for detecting the position, along the scanning direction, of the fine movement stage; a second measuring device for detecting the position, along the scanning direction, of the other one of the mask stage and the substrate stage; a speed controller for controlling the ratio between the speeds of the mask stage and the substrate stage to a predetermined value while the pattern on the mask is scanning-exposed on the substrate; and a control device for controlling the position of the fine movement stage in accordance with the difference between the position measured by the first measuring device and the position measured by the second measuring device during the scanning exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.