Substrate cleaning apparatus and method
US6260562A · kind A · utility
58Cited by
7References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 6, 1998 |
| Grant date | Jul 17, 2001 |
| Priority date | — |
| Expiry date | Oct 6, 2018 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate cleaning apparatus includes a spin support for supporting and spinning a substrate, a nozzle for discharging a cleaning liquid with a given cleaning condition from a discharge opening, a moving mechanism for moving the nozzle at least between center and edge of the substrate, a cleaning condition adjuster for adjusting the cleaning condition, and a controller for controlling the cleaning condition adjuster to vary the cleaning condition according to a cleaning liquid supply position movable over the substrate surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.