Optical element with substrate containing fluorite as main ingredient, and method and apparatus for producing the optical element
US6261696A · kind A · utility
8Cited by
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14Claims
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Key dates
| Filing date | Mar 18, 1997 |
| Grant date | Jul 17, 2001 |
| Priority date | — |
| Expiry date | Mar 18, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A film formation method of forming at least one layered film on a substrate containing fluorite as a main ingredient by using a film formation apparatus which emits electrons or ions, which comprises the step of forming, as a first layered film counted from the side of the substrate, a film having a thickness of 30 nm or less and comprising at least one selected from the group consisting of SiO.sub.2, BeO, MgO, and MgF.sub.2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.