Patent · US Expired

Fast recovery diode and method for its manufacture

US6261874A · kind A · utility

6Cited by
1References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 14, 2000
Grant dateJul 17, 2001
Priority date
Expiry dateJun 14, 2020

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S257/91

Abstract

A soft recovery diode is made by first implanting helium into the die to a location below the P/N junction and the implant annealed. An E-beam radiation process then is applied to the entire wafer and is also annealed. The diode then has very soft recovery characteristics without requiring heavy metal doping.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.