Photoresist polymers of carboxyl-containing alicyclic compounds
US6265130A · kind A · utility
12Cited by
10References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 29, 1999 |
| Grant date | Jul 24, 2001 |
| Priority date | — |
| Expiry date | Apr 29, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to a carboxyl-containing alicyclic compound represented by Chemical Formula 1: ##STR1## wherein, R.sub.1 and R.sub.2, which may be identical to or different from each other, represent hydrogen or a tert-butyl group; X represents hydrogen, hydroxy or oxygen; and n represents a number from 1 to 3. Compounds of the present invention are useful as monomers in a photoresist resin, and in a process for preparing the same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.